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@ARTICLE{Kim:824449,
author = {Kim, Wonjoo and Rösgen, Bernd and Breuer, Thomas and
Menzel, Stephan and Wouters, Dirk and Waser, R. and Rana,
Vikas},
title = {{N}onlinearity analysis of {T}a{OX} redox-based {RRAM}},
journal = {Microelectronic engineering},
volume = {154},
issn = {0167-9317},
address = {[S.l.]},
publisher = {Elsevier},
reportid = {FZJ-2016-07038},
pages = {38 - 41},
year = {2016},
abstract = {For the passive crossbar integration of redox-based
resistive RAM (ReRAM), understanding the nonlinearity (NL)
of the I–V characteristics and its impact on the device
parameters are highly required. Here, we report the NL of
TiN/TaOx/Ta/Pt ReRAM for different switching oxide
thicknesses (7.0 nm vs. 3.5 nm) and various device sizes (85
nm × 85 nm to 135 nm × 135 nm) as function of SET current
compliance levels as well as the SET current compliance
impact on the resistance ratio (off to on). The NL in pulsed
AC mode improves with lower current compliance levels
regardless of device area. At extremely low compliance
level, the device shows the highest NL of 12 in the AC mode.
The resistance ratio and the NL parameter in the ReRAM
device are observed to be the competing factors as the
resistance ratio degrades with improvement of the NL at the
lower current compliance level. However, the NL parameter is
independent of the switching layer thickness.},
cin = {PGI-7 / PGI-10 / JARA-FIT},
ddc = {620},
cid = {I:(DE-Juel1)PGI-7-20110106 / I:(DE-Juel1)PGI-10-20170113 /
$I:(DE-82)080009_20140620$},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000378363400007},
doi = {10.1016/j.mee.2016.01.025},
url = {https://juser.fz-juelich.de/record/824449},
}