%0 Patent
%A Faley, Michael
%T Sputtering sources for high-pressure sputtering with large targets and sputtering method
%M FZJ-2016-07272
%@ US9481928B2
%D 2016
%F PUB:(DE-HGF)23
%9 Patent
%N 13/876,648
%U https://juser.fz-juelich.de/record/824714