000824714 001__ 824714
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000824714 0247_ $$2Patent$$a13/876,648
000824714 037__ $$aFZJ-2016-07272
000824714 041__ $$aEnglish
000824714 1001_ $$0P:(DE-Juel1)130633$$aFaley, Michael$$b0$$eCorresponding author
000824714 245__ $$aSputtering sources for high-pressure sputtering with large targets and sputtering method
000824714 260__ $$c2016
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000824714 536__ $$0G:(DE-HGF)POF3-144$$a144 - Controlling Collective States (POF3-144)$$cPOF3-144$$fPOF III$$x0
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000824714 9141_ $$y2016
000824714 920__ $$lyes
000824714 9201_ $$0I:(DE-Juel1)PGI-5-20110106$$kPGI-5$$lMikrostrukturforschung$$x0
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