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@ARTICLE{Kireev:825950,
      author       = {Kireev, D. and Sarik, Dario and Wu, T. and Xie, X. and
                      Wolfrum, B. and Offenhäusser, A.},
      title        = {{H}igh throughput transfer technique: {S}ave your graphene},
      journal      = {Carbon},
      volume       = {107},
      issn         = {0008-6223},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier Science},
      reportid     = {FZJ-2017-00222},
      pages        = {319 - 324},
      year         = {2016},
      abstract     = {The development rate of graphene-related research is
                      tremendous. New methods of graphene growth and transfer are
                      reported on a regular basis, trending towards large-scale.
                      Nevertheless, the fabrication of high-yield and low-cost
                      graphene devices is still challenging. In this work, we
                      approach this problem from a technological point of view and
                      propose a new, so-called “high-throughput transfer
                      technique”. The technique allows a semi-automatic transfer
                      of graphene films right at the desired places on a wafer. We
                      demonstrate the applicability of our method by aligning 52
                      graphene devices on a 4-inch wafer using only 4 cm2 of
                      graphene. The overall yield of this process is over $90\%.$},
      cin          = {ICS-8 / PGI-8},
      ddc          = {540},
      cid          = {I:(DE-Juel1)ICS-8-20110106 / I:(DE-Juel1)PGI-8-20110106},
      pnm          = {552 - Engineering Cell Function (POF3-552)},
      pid          = {G:(DE-HGF)POF3-552},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000380803600038},
      doi          = {10.1016/j.carbon.2016.05.058},
      url          = {https://juser.fz-juelich.de/record/825950},
}