% IMPORTANT: The following is UTF-8 encoded. This means that in the presence % of non-ASCII characters, it will not work with BibTeX 0.99 or older. % Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or % “biber”. @ARTICLE{Kireev:825950, author = {Kireev, D. and Sarik, Dario and Wu, T. and Xie, X. and Wolfrum, B. and Offenhäusser, A.}, title = {{H}igh throughput transfer technique: {S}ave your graphene}, journal = {Carbon}, volume = {107}, issn = {0008-6223}, address = {Amsterdam [u.a.]}, publisher = {Elsevier Science}, reportid = {FZJ-2017-00222}, pages = {319 - 324}, year = {2016}, abstract = {The development rate of graphene-related research is tremendous. New methods of graphene growth and transfer are reported on a regular basis, trending towards large-scale. Nevertheless, the fabrication of high-yield and low-cost graphene devices is still challenging. In this work, we approach this problem from a technological point of view and propose a new, so-called “high-throughput transfer technique”. The technique allows a semi-automatic transfer of graphene films right at the desired places on a wafer. We demonstrate the applicability of our method by aligning 52 graphene devices on a 4-inch wafer using only 4 cm2 of graphene. The overall yield of this process is over $90\%.$}, cin = {ICS-8 / PGI-8}, ddc = {540}, cid = {I:(DE-Juel1)ICS-8-20110106 / I:(DE-Juel1)PGI-8-20110106}, pnm = {552 - Engineering Cell Function (POF3-552)}, pid = {G:(DE-HGF)POF3-552}, typ = {PUB:(DE-HGF)16}, UT = {WOS:000380803600038}, doi = {10.1016/j.carbon.2016.05.058}, url = {https://juser.fz-juelich.de/record/825950}, }