%0 Conference Paper
%A Moers, Jürgen
%A Mikulics, M.
%A Marso, M.
%A Trellenkamp, St.
%A Sofer, Z.
%A Grutzmacher, D.
%A Hardtdegen, H.
%T Fabrication of UV sources for novel lithographical techniques: Development of nano-LED etching procedures
%I IEEE
%M FZJ-2017-00842
%P 81-84
%D 2016
%Z ISBN 978-1-5090-3083-5
%X The development of two different dry etching approaches — ion beam etching (IBE) and reactive ion etching (RIE) — is reported for the fabrication of nano-LEDs as UV sources. The IBE approach leads to nano-LEDs with higher emission intensity but with rougher side-walls and broader FWHM.
%B 2016 11th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM)
%C 13 Nov 2016 - 16 Nov 2016, Smolenice (Slovakia)
Y2 13 Nov 2016 - 16 Nov 2016
M2 Smolenice, Slovakia
%F PUB:(DE-HGF)8
%9 Contribution to a conference proceedings
%R 10.1109/ASDAM.2016.7805900
%U https://juser.fz-juelich.de/record/826623