TY  - CONF
AU  - Moers, Jürgen
AU  - Mikulics, M.
AU  - Marso, M.
AU  - Trellenkamp, St.
AU  - Sofer, Z.
AU  - Grutzmacher, D.
AU  - Hardtdegen, H.
TI  - Fabrication of UV sources for novel lithographical techniques: Development of nano-LED etching procedures
PB  - IEEE
M1  - FZJ-2017-00842
SP  - 81-84
PY  - 2016
N1  - ISBN 978-1-5090-3083-5
AB  - The development of two different dry etching approaches — ion beam etching (IBE) and reactive ion etching (RIE) — is reported for the fabrication of nano-LEDs as UV sources. The IBE approach leads to nano-LEDs with higher emission intensity but with rougher side-walls and broader FWHM.
T2  - 2016 11th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM)
CY  - 13 Nov 2016 - 16 Nov 2016, Smolenice (Slovakia)
Y2  - 13 Nov 2016 - 16 Nov 2016
M2  - Smolenice, Slovakia
LB  - PUB:(DE-HGF)8
DO  - DOI:10.1109/ASDAM.2016.7805900
UR  - https://juser.fz-juelich.de/record/826623
ER  -