Hauptseite > Publikationsdatenbank > Fabrication of UV sources for novel lithographical techniques: Development of nano-LED etching procedures > print

001     826623
005     20210129225645.0
024 7 _ |a 10.1109/ASDAM.2016.7805900
|2 doi
037 _ _ |a FZJ-2017-00842
100 1 _ |a Moers, Jürgen
|0 P:(DE-Juel1)128616
|b 0
|u fzj
111 2 _ |a 2016 11th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM)
|c Smolenice
|d 2016-11-13 - 2016-11-16
|w Slovakia
245 _ _ |a Fabrication of UV sources for novel lithographical techniques: Development of nano-LED etching procedures
260 _ _ |c 2016
|b IEEE
300 _ _ |a 81-84
336 7 _ |a CONFERENCE_PAPER
|2 ORCID
336 7 _ |a Conference Paper
|0 33
|2 EndNote
336 7 _ |a INPROCEEDINGS
|2 BibTeX
336 7 _ |a conferenceObject
|2 DRIVER
336 7 _ |a Output Types/Conference Paper
|2 DataCite
336 7 _ |a Contribution to a conference proceedings
|b contrib
|m contrib
|0 PUB:(DE-HGF)8
|s 1485413067_32140
|2 PUB:(DE-HGF)
500 _ _ |a ISBN 978-1-5090-3083-5
520 _ _ |a The development of two different dry etching approaches — ion beam etching (IBE) and reactive ion etching (RIE) — is reported for the fabrication of nano-LEDs as UV sources. The IBE approach leads to nano-LEDs with higher emission intensity but with rougher side-walls and broader FWHM.
536 _ _ |a 521 - Controlling Electron Charge-Based Phenomena (POF3-521)
|0 G:(DE-HGF)POF3-521
|c POF3-521
|f POF III
|x 0
588 _ _ |a Dataset connected to CrossRef Conference
700 1 _ |a Mikulics, M.
|0 P:(DE-Juel1)128613
|b 1
|e Corresponding author
700 1 _ |a Marso, M.
|0 P:(DE-HGF)0
|b 2
700 1 _ |a Trellenkamp, St.
|0 P:(DE-Juel1)128856
|b 3
700 1 _ |a Sofer, Z.
|0 P:(DE-HGF)0
|b 4
700 1 _ |a Grutzmacher, D.
|0 P:(DE-Juel1)125588
|b 5
700 1 _ |a Hardtdegen, H.
|0 P:(DE-Juel1)125593
|b 6
773 _ _ |a 10.1109/ASDAM.2016.7805900
856 4 _ |u https://juser.fz-juelich.de/record/826623/files/07805900.pdf
|y Restricted
856 4 _ |u https://juser.fz-juelich.de/record/826623/files/07805900.gif?subformat=icon
|x icon
|y Restricted
856 4 _ |u https://juser.fz-juelich.de/record/826623/files/07805900.jpg?subformat=icon-1440
|x icon-1440
|y Restricted
856 4 _ |u https://juser.fz-juelich.de/record/826623/files/07805900.jpg?subformat=icon-180
|x icon-180
|y Restricted
856 4 _ |u https://juser.fz-juelich.de/record/826623/files/07805900.jpg?subformat=icon-640
|x icon-640
|y Restricted
856 4 _ |u https://juser.fz-juelich.de/record/826623/files/07805900.pdf?subformat=pdfa
|x pdfa
|y Restricted
909 C O |o oai:juser.fz-juelich.de:826623
|p VDB
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)128616
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 1
|6 P:(DE-Juel1)128613
910 1 _ |a PGI-8-PT
|0 I:(DE-Juel1)PGI-8-PT-20110228
|k PGI-8-PT
|b 3
|6 P:(DE-Juel1)128856
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 5
|6 P:(DE-Juel1)125588
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 6
|6 P:(DE-Juel1)125593
913 1 _ |a DE-HGF
|b Key Technologies
|l Future Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)
|1 G:(DE-HGF)POF3-520
|0 G:(DE-HGF)POF3-521
|2 G:(DE-HGF)POF3-500
|v Controlling Electron Charge-Based Phenomena
|x 0
|4 G:(DE-HGF)POF
|3 G:(DE-HGF)POF3
914 1 _ |y 2016
915 _ _ |a No Authors Fulltext
|0 StatID:(DE-HGF)0550
|2 StatID
920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)PGI-9-20110106
|k PGI-9
|l Halbleiter-Nanoelektronik
|x 0
920 1 _ |0 I:(DE-Juel1)PGI-8-PT-20110228
|k PGI-8-PT
|l PGI-8-PT
|x 1
920 1 _ |0 I:(DE-82)080009_20140620
|k JARA-FIT
|l JARA-FIT
|x 2
980 _ _ |a contrib
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a I:(DE-Juel1)PGI-9-20110106
980 _ _ |a I:(DE-Juel1)PGI-8-PT-20110228
980 _ _ |a I:(DE-82)080009_20140620

LibraryCollectionCLSMajorCLSMinorLanguageAuthor
Marc 21