%0 Journal Article
%A Kim, Hyun-su
%A Baksh, Peter
%A Odstrcil, Michal
%A Miszczak, Magdalena
%A Frey, Jeremy G.
%A Juschkin, Larissa
%A Brocklesby, William S.
%T Lloyd’s mirror interference lithography with EUV radiation from a high-harmonic source
%J Applied physics express
%V 9
%N 7
%@ 1882-0786
%C Tokyo
%I ¯Oy¯o Butsuri-Gakkai
%M FZJ-2017-01409
%P 076701 -
%D 2016
%X We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000379310000042
%R 10.7567/APEX.9.076701
%U https://juser.fz-juelich.de/record/827211