Journal Article

FZJ-2017-01409

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Lloyd’s mirror interference lithography with EUV radiation from a high-harmonic source

Kim, H.-s. (Corresponding author)FZJ*RWTH* ; Baksh, P. ; Odstrcil, M.FZJ*RWTH* ; Miszczak, M. ; Frey, J. G. ; Juschkin, L.FZJ*RWTH* ; Brocklesby, W. S.

2016
¯Oy¯o Butsuri-Gakkai Tokyo

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Please use a persistent id in citations: http://hdl.handle.net/2128/13749  doi:10.7567/APEX.9.076701

Abstract: We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. JARA-FIT (JARA-FIT)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2016

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Database coverage:
; ; Current Contents - Physical, Chemical and Earth Sciences ; IF < 5 ; JCR ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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