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000827211 1001_ $$0P:(DE-HGF)0$$aKim, Hyun-su$$b0$$eCorresponding author
000827211 245__ $$aLloyd’s mirror interference lithography with EUV radiation from a high-harmonic source
000827211 260__ $$aTokyo$$b¯Oy¯o Butsuri-Gakkai$$c2016
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000827211 520__ $$aWe demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.
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000827211 7001_ $$0P:(DE-HGF)0$$aOdstrcil, Michal$$b2
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000827211 7001_ $$0P:(DE-HGF)0$$aFrey, Jeremy G.$$b4
000827211 7001_ $$0P:(DE-Juel1)157957$$aJuschkin, Larissa$$b5
000827211 7001_ $$0P:(DE-HGF)0$$aBrocklesby, William S.$$b6
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