TY  - JOUR
AU  - Kim, Hyun-su
AU  - Baksh, Peter
AU  - Odstrcil, Michal
AU  - Miszczak, Magdalena
AU  - Frey, Jeremy G.
AU  - Juschkin, Larissa
AU  - Brocklesby, William S.
TI  - Lloyd’s mirror interference lithography with EUV radiation from a high-harmonic source
JO  - Applied physics express
VL  - 9
IS  - 7
SN  - 1882-0786
CY  - Tokyo
PB  - ¯Oy¯o Butsuri-Gakkai
M1  - FZJ-2017-01409
SP  - 076701 -
PY  - 2016
AB  - We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000379310000042
DO  - DOI:10.7567/APEX.9.076701
UR  - https://juser.fz-juelich.de/record/827211
ER  -