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| 001 | 827211 | ||
| 005 | 20210129225808.0 | ||
| 024 | 7 | _ | |2 doi |a 10.7567/APEX.9.076701 |
| 024 | 7 | _ | |2 ISSN |a 1882-0778 |
| 024 | 7 | _ | |2 ISSN |a 1882-0786 |
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| 037 | _ | _ | |a FZJ-2017-01409 |
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| 100 | 1 | _ | |0 P:(DE-HGF)0 |a Kim, Hyun-su |b 0 |e Corresponding author |
| 245 | _ | _ | |a Lloyd’s mirror interference lithography with EUV radiation from a high-harmonic source |
| 260 | _ | _ | |a Tokyo |b ¯Oy¯o Butsuri-Gakkai |c 2016 |
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| 520 | _ | _ | |a We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed. |
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| 700 | 1 | _ | |0 P:(DE-Juel1)157957 |a Juschkin, Larissa |b 5 |
| 700 | 1 | _ | |0 P:(DE-HGF)0 |a Brocklesby, William S. |b 6 |
| 773 | _ | _ | |0 PERI:(DE-600)2417569-9 |a 10.7567/APEX.9.076701 |g Vol. 9, no. 7, p. 076701 - |n 7 |p 076701 - |t Applied physics express |v 9 |x 1882-0786 |y 2016 |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/827211/files/Kim_2016_Appl._Phys._Express_9_076701.pdf |y OpenAccess |
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