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000837842 1001_ $$0P:(DE-HGF)0$$aFischione, Paul E.$$b0$$eCorresponding author
000837842 245__ $$aA Small Spot, Inert Gas, Ion Milling Process as a Complementary Technique to Focused Ion Beam Specimen Preparation
000837842 260__ $$aNew York, NY$$bCambridge University Press$$c2017
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000837842 520__ $$aThis paper reports on the substantial improvement of specimen quality by use of a low voltage (0.05 to ~1 keV), small diameter (~1 μm), argon ion beam following initial preparation using conventional broad-beam ion milling or focused ion beam. The specimens show significant reductions in the amorphous layer thickness and implanted artifacts. The targeted ion milling controls the specimen thickness according to the needs of advanced aberration-corrected and/or analytical transmission electron microscopy applications.
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000837842 7001_ $$0P:(DE-HGF)0$$aWilliams, Robert E. A.$$b1
000837842 7001_ $$0P:(DE-HGF)0$$aGenç, Arda$$b2
000837842 7001_ $$0P:(DE-HGF)0$$aFraser, Hamish L.$$b3
000837842 7001_ $$0P:(DE-Juel1)144121$$aDunin-Borkowski, Rafal$$b4
000837842 7001_ $$0P:(DE-Juel1)130811$$aLuysberg, Martina$$b5
000837842 7001_ $$0P:(DE-HGF)0$$aBonifacio, Cecile S.$$b6
000837842 7001_ $$0P:(DE-Juel1)144926$$aKovács, András$$b7
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