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@ARTICLE{Fischione:837842,
author = {Fischione, Paul E. and Williams, Robert E. A. and Genç,
Arda and Fraser, Hamish L. and Dunin-Borkowski, Rafal and
Luysberg, Martina and Bonifacio, Cecile S. and Kovács,
András},
title = {{A} {S}mall {S}pot, {I}nert {G}as, {I}on {M}illing
{P}rocess as a {C}omplementary {T}echnique to {F}ocused
{I}on {B}eam {S}pecimen {P}reparation},
journal = {Microscopy and microanalysis},
volume = {23},
number = {04},
issn = {1435-8115},
address = {New York, NY},
publisher = {Cambridge University Press},
reportid = {FZJ-2017-06619},
pages = {782 - 793},
year = {2017},
abstract = {This paper reports on the substantial improvement of
specimen quality by use of a low voltage (0.05 to ~1 keV),
small diameter (~1 μm), argon ion beam following initial
preparation using conventional broad-beam ion milling or
focused ion beam. The specimens show significant reductions
in the amorphous layer thickness and implanted artifacts.
The targeted ion milling controls the specimen thickness
according to the needs of advanced aberration-corrected
and/or analytical transmission electron microscopy
applications.},
cin = {ER-C-1 / PGI-5},
ddc = {570},
cid = {I:(DE-Juel1)ER-C-1-20170209 / I:(DE-Juel1)PGI-5-20110106},
pnm = {143 - Controlling Configuration-Based Phenomena (POF3-143)},
pid = {G:(DE-HGF)POF3-143},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000407563800010},
doi = {10.1017/S1431927617000514},
url = {https://juser.fz-juelich.de/record/837842},
}