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000838248 1001_ $$0P:(DE-Juel1)164460$$aHe, Wenting$$b0$$eCorresponding author$$ufzj
000838248 245__ $$aExcitation Temperature and Constituent Concentration Profiles of the Plasma Jet Under Plasma Spray-PVD Conditions
000838248 260__ $$aDordrecht$$bSpringer Science + Business Media B.V.$$c2017
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000838248 520__ $$aPlasma spray-physical vapor deposition (PS-PVD) is a promising technology to produce columnar structured thermal barrier coatings with excellent cyclic lifetime. The characteristics of plasma jets generated by standard plasma gases in the PS-PVD process, argon and helium, have been studied by optical emission spectroscopy. Abel inversion was introduced to reconstruct the spatial characteristics. In the central area of the plasma jet, the ionization of argon was found to be one of the reasons for low emission of atomic argon. Another reason could be the demixing so that helium prevails around the central axis of the plasma jet. The excitation temperature of argon was calculated by the Boltzmann plot method. Its values decreased from the center to the edge of the plasma jet. Applying the same method, a spurious high excitation temperature of helium was obtained, which could be caused by the strong deviation from local thermal equilibrium of helium. The addition of hydrogen into plasma gases leads to a lower excitation temperature, however a higher substrate temperature due to the high thermal conductivity induced by the dissociation of hydrogen. A loading effect is exerted by the feedstock powder on the plasma jet, which was found to reduce the average excitation temperature considerably by more than 700 K in the Ar/He jet.
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000838248 7001_ $$0P:(DE-Juel1)129633$$aMauer, Georg$$b1$$ufzj
000838248 7001_ $$0P:(DE-Juel1)129670$$aVaßen, Robert$$b2$$ufzj
000838248 773__ $$0PERI:(DE-600)2018594-7$$a10.1007/s11090-017-9832-8$$gVol. 37, no. 5, p. 1293 - 1311$$n5$$p1293 - 1311$$tPlasma chemistry and plasma processing$$v37$$x1572-8986$$y2017
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