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@PHDTHESIS{Zimmermann:838894,
      author       = {Zimmermann, Thomas},
      title        = {{H}igh-rate growth of hydrogenated amorphous and
                      microcrystalline silicon for thin-film silicon solar cells
                      using dynamic very-high frequency plasma-enhanced chemical
                      vapor deposition},
      volume       = {183},
      school       = {Universität Dresden},
      type         = {Dissertation},
      address      = {Jülich},
      publisher    = {Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag},
      reportid     = {FZJ-2017-07400},
      isbn         = {978-3-89336-892-1},
      series       = {Schriften des Forschungszentrums Jülich / Reihe Energie
                      $\&$ Umwelt},
      pages        = {126 S : graph. Darst},
      year         = {2013},
      note         = {Dissertation, Universität Dresden, 2013},
      abstract     = {Thin-film silicon tandem solar cells based on a
                      hydrogenated amorphous silicon (a-Si:H) top-cell and a
                      hydrogenated microcrystalline silicon (μc-Si:H) bottom-cell
                      are a promising photovoltaic technology as they use a
                      combination of absorber materials that is ideally suited for
                      the solar spectrum. Additionally, the involved materials are
                      abundant and non-toxic which is important for the
                      manufacturing and application on a large scale. One of the
                      most important factors for the application of photovoltaic
                      technologies is the cost per watt. There are several ways to
                      reduce this figure: increasing the efficiency of the solar
                      cells, reducing the material consumption and increasing the
                      throughput of the manufacturing equipment. The use of
                      very-high frequencies has been proven to be beneficial for
                      the material quality at high deposition rates thus enabling
                      a high throughput and high solar cell efficiencies. In the
                      present work a scalable very-high frequency plasma-enhanced
                      chemical vapor deposition (VHF-PECVD) technique for
                      state-of-the-art solar cells is developed. Linear plasma
                      sources are applied which facilitate the use of very-high
                      frequencies on large areas without compromising on the
                      homogeneity of the deposition process. The linear plasma
                      sources require a dynamic deposition process with the
                      substrate passing by the electrodes in order to achieve a
                      homogeneous deposition on large areas. State-of-the-art
                      static radio-frequency (RF) PECVD processes are used as a
                      referencein order to assess the potential of a dynamic
                      VHF-PECVD technique for the growth of high-quality a-Si:H
                      and $\mu$c-Si:H absorber layers at high rates. In chapter 4
                      the influence of the deposition process of the $\mu$c-Si:H
                      i-layer on the solar cell performance is studied for static
                      deposition processes. It is shown that the
                      correlationbetween the i-layer growth rate, its
                      crystallinity and the solar cell performance is similar for
                      VHF- and RF-PECVD processes despite the different electrode
                      configurations, excitation frequencies and process regimes.
                      It is found that solar cells incorporating i-layers grown
                      statically using VHF-PECVD processes obtain a
                      state-of-the-art efficiency close to 8 \% for growth rates
                      up to 1.4 nm/s compared to 0.53 nm/s for RF-PECVD processes.
                      [...]},
      keywords     = {Solarzelle (gnd) / Mikrokristall (gnd) / Silicone (gnd)},
      cin          = {IEK-5},
      ddc          = {500},
      cid          = {I:(DE-Juel1)IEK-5-20101013},
      pnm          = {899 - ohne Topic (POF3-899)},
      pid          = {G:(DE-HGF)POF3-899},
      typ          = {PUB:(DE-HGF)3 / PUB:(DE-HGF)11},
      url          = {https://juser.fz-juelich.de/record/838894},
}