%0 Journal Article
%A Duchamp, Martial
%A Girard, Olivier
%A Pozzi, Giulio
%A Soltner, Helmut
%A Winkler, Florian
%A Speen, Rolf
%A Cooper, David
%A Dunin-Borkowski, Rafal
%T Fine electron biprism on a Si-on-insulator chip for off-axis electron holography
%J Ultramicroscopy
%V 185
%@ 0304-3991
%C Amsterdam
%I Elsevier Science
%M FZJ-2017-07956
%P 81-89
%D 2018
%X Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments.
%F PUB:(DE-HGF)16
%9 Journal Article
%$ pmid:29223803
%U <Go to ISI:>//WOS:000423963900012
%R 10.1016/j.ultramic.2017.11.012
%U https://juser.fz-juelich.de/record/840439