Journal Article

FZJ-2017-07956

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Fine electron biprism on a Si-on-insulator chip for off-axis electron holography

Duchamp, M. (Corresponding author)FZJ* ; Girard, O. ; Pozzi, G. ; Soltner, H.FZJ* ; Winkler, F.FZJ* ; Speen, R.FZJ* ; Cooper, D. ; Dunin-Borkowski, R.FZJ*

2018
Elsevier Science Amsterdam

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Please use a persistent id in citations: http://hdl.handle.net/2128/18583  doi:10.1016/j.ultramic.2017.11.012

Abstract: Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments.

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Contributing Institute(s):

1. Physik Nanoskaliger Systeme (ER-C-1)
2. Zentralinstitut für Technologie (ZEA-1)

Research Program(s):

1. 899 - ohne Topic (POF3-899) (POF3-899)

Appears in the scientific report 2018

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Database coverage:
; ; ; BIOSIS Previews ; Current Contents - Life Sciences ; Current Contents - Physical, Chemical and Earth Sciences ; Ebsco Academic Search ; IF < 5 ; JCR ; NCBI Molecular Biology Database ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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