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000843758 245__ $$aExtended metastable Al solubility in cubic VAlN by metal-ion bombardment during pulsed magnetron sputtering: film stress vs subplantation
000843758 260__ $$aMelville, NY$$bAmerican Inst. of Physics$$c2017
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000843758 7001_ $$0P:(DE-HGF)0$$aRuess, H.$$b2
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000843758 7001_ $$0P:(DE-HGF)0$$aLu, J.$$b4
000843758 7001_ $$00000-0002-2837-3656$$aHultman, L.$$b5
000843758 7001_ $$0P:(DE-HGF)0$$aSchneider, J. M.$$b6
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