| Home > External Publications > Vita Publications > Extended metastable Al solubility in cubic VAlN by metal-ion bombardment during pulsed magnetron sputtering: film stress vs subplantation |
| Journal Article | FZJ-2018-01310 |
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2017
American Inst. of Physics
Melville, NY
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Please use a persistent id in citations: doi:10.1063/1.4991640
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