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@ARTICLE{Assali:849685,
author = {Assali, S. and Dijkstra, A. and Li, A. and Koelling, S. and
Verheijen, M. A. and Gagliano, L. and von den Driesch, N.
and Buca, D. and Koenraad, P. M. and Haverkort, J. E. M. and
Bakkers, E. P. A. M.},
title = {{G}rowth and {O}ptical {P}roperties of {D}irect {B}and
{G}ap {G}e/{G}e 0.87 {S}n 0.13 {C}ore/{S}hell {N}anowire
{A}rrays},
journal = {Nano letters},
volume = {17},
number = {3},
issn = {1530-6992},
address = {Washington, DC},
publisher = {ACS Publ.},
reportid = {FZJ-2018-03821},
pages = {1538 - 1544},
year = {2017},
abstract = {Group IV semiconductor optoelectronic devices are now
possible by using strain-free direct band gap GeSn alloys
grown on a Ge/Si virtual substrate with Sn contents above
$9\%.$ Here, we demonstrate the growth of Ge/GeSn core/shell
nanowire arrays with Sn incorporation up to $13\%$ and
without the formation of Sn clusters. The nanowire geometry
promotes strain relaxation in the Ge0.87Sn0.13 shell and
limits the formation of structural defects. This results in
room-temperature photoluminescence centered at 0.465 eV and
enhanced absorption above $98\%.$ Therefore, direct band gap
GeSn grown in a nanowire geometry holds promise as a
low-cost and high-efficiency material for photodetectors
operating in the short-wave infrared and thermal imaging
devices.},
cin = {PGI-9 / JARA-FIT},
ddc = {540},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
pubmed = {pmid:28165747},
UT = {WOS:000396185800031},
doi = {10.1021/acs.nanolett.6b04627},
url = {https://juser.fz-juelich.de/record/849685},
}