Journal Article

FZJ-2018-03824

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Fabrication, Characterization, and Analysis of Ge/GeSn Heterojunction p-Type Tunnel Transistors

Schulte-Braucks, C. (Corresponding author)FZJ* ; Pandey, R. ; Sajjad, R. N. ; Barth, M. ; Ghosh, R. K. ; Grisafe, B. ; Sharma, P. ; von den Driesch, N.FZJ* ; Vohra, A. ; Rayner, G. B. ; Loo, R. ; Mantl, S.FZJ* ; Buca, D. M.FZJ* ; Yeh, C.-C. ; Wu, C.-H. ; Tsai, W. ; Antoniadis, D. A. ; Datta, S.

2017
IEEE New York, NY

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Please use a persistent id in citations: doi:10.1109/TED.2017.2742957

Abstract: We present a detailed study on fabrication and characterization of Ge/GeSn heterojunction p-type tunnel-field-effect-transistors (TFETs). Critical process modules as high-k stack and p-i-n diodes are addressed individually. As a result an ultrathin equivalent oxide thickness of 0.84 nm with an accumulation capacitance of 3 μF/cm2 was achieved on an extremely scaled tri-layer stack of GeSnOx/Al2O3/HfO2 deposited by atomic-layer deposition monitored in situ by spectroscopic ellipsometry. Combining these process modules, Ge/GeSn heterojunction pTFETs are fabricated and characterized to demonstrate the best in-class pTFET performance in the GeSn material system. The transfer characteristics of the TFETs show signatures of the trap-assisted thermal generation in the subthreshold regime which is explained by a modified Shockley- Read-Hall model. For the ON-state current, we used band-to-band tunneling models calculated using parameters from the density functional theory. We then use the calibrated model to project performance of GeSn pTFETs with increased Sn content (lower bandgap), reduced trap density and ultrathin body geometry. Both experimental and projected results are benchmarked against state-of-the art III-V (e.g., In0.65Ga0.35/GaAs0.4Sb0.6) pTFETs. We demonstrate the ability of GeSn to achieve superior performance with both high ON-current and sub-60 mV/decade switching benefiting from the small and direct bandgap for higher Sn contents.

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. JARA-FIT (JARA-FIT)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2018

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Database coverage:
; Current Contents - Engineering, Computing and Technology ; Ebsco Academic Search ; IF < 5 ; JCR ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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