Hauptseite > Publikationsdatenbank > Magnetic Field-Assisted Chemical Vapor Deposition of Iron Oxide Thin Films: Influence of Field–Matter Interactions on Phase Composition and Morphology > print |
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100 | 1 | _ | |a Stadler, Daniel |0 0000-0003-3233-9167 |b 0 |
245 | _ | _ | |a Magnetic Field-Assisted Chemical Vapor Deposition of Iron Oxide Thin Films: Influence of Field–Matter Interactions on Phase Composition and Morphology |
260 | _ | _ | |a Washington, DC |c 2019 |b ACS |
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520 | _ | _ | |a Magnetic field-assisted CVD offers a direct pathway to manipulate the evolution of microstructure, phase composition, and magnetic properties of the as-prepared film. We report on the role of applied magnetic fields (0.5 T) during a cold-wall CVD deposition of iron oxide from [FeIII(OtBu)3]2 leading to higher crystallinity, larger particulates, and better out-of-plane magnetic anisotropy, if compared with zero-field depositions. Whereas selective formation of homogeneous magnetite films was observed for the field-assisted process, coexistence of hematite and amorphous iron(III) oxide was confirmed under zero-field conditions. Comparison of the coercive field (11 vs 60 mT) indicated lower defect concentration for the field-assisted process with nearly superparamagnetic behavior. X-ray photoemission electron microscopy (X-PEEM) in absorption mode at the O-K and Fe-L3,2 edges confirmed the selective formation of magnetite (field-assisted) and hematite (zero-field) with coexisting amorphous phases, respectively, emphasizing the importance of field–matter interactions in the phase-selective synthesis of magnetic thin films. |
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700 | 1 | _ | |a Brede, Thomas |0 P:(DE-HGF)0 |b 2 |
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700 | 1 | _ | |a Fischer, Thomas |0 0000-0002-8363-9613 |b 4 |
700 | 1 | _ | |a Sarkar, Anirban |0 P:(DE-Juel1)172634 |b 5 |
700 | 1 | _ | |a Giesen, Margret |0 P:(DE-Juel1)4744 |b 6 |
700 | 1 | _ | |a Schneider, Claus M. |0 P:(DE-Juel1)130948 |b 7 |
700 | 1 | _ | |a Volkert, Cynthia A. |0 P:(DE-HGF)0 |b 8 |
700 | 1 | _ | |a Mathur, Sanjay |0 0000-0003-2765-2693 |b 9 |e Corresponding author |
773 | _ | _ | |a 10.1021/acs.jpclett.9b02381 |g Vol. 10, no. 20, p. 6253 - 6259 |0 PERI:(DE-600)2522838-9 |n 20 |p 6253 - 6259 |t The journal of physical chemistry letters |v 10 |y 2019 |x 1948-7185 |
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