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000874317 1001_ $$0P:(DE-Juel1)162152$$aMaurer, Claudia$$b0
000874317 245__ $$aImpact of Laser Treatment on Hydrogenated Amorphous Silicon Properties
000874317 260__ $$aFrankfurt, M.$$bDeutsche Gesellschaft für Materialkunde$$c2020
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000874317 520__ $$aHerein, the application of laser radiation to locally modify the hydrogen distribution within hydrogenated amorphous silicon films on a short time scale is studied. The impact of laser power and irradiation time on the temperature of the silicon layer during the laser treatment and the hydrogen outdiffusion is analyzed. Moreover, the resulting optoelectronic properties of the amorphous silicon are examined. On a timescale of a few seconds or less, the hydrogen concentration in the near‐surface region of the silicon layer can be successfully decreased without major impact on the optoelectronic properties.
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000874317 7001_ $$0P:(DE-Juel1)130217$$aBeyer, Wolfhard$$b1
000874317 7001_ $$0P:(DE-Juel1)130251$$aHülsbeck, Markus$$b2
000874317 7001_ $$0P:(DE-Juel1)133840$$aBreuer, Uwe$$b3
000874317 7001_ $$0P:(DE-Juel1)143905$$aRau, Uwe$$b4
000874317 7001_ $$0P:(DE-Juel1)130246$$aHaas, Stefan$$b5$$eCorresponding author
000874317 773__ $$0PERI:(DE-600)2016980-2$$a10.1002/adem.201901437$$gp. adem.201901437$$n6$$p1901437$$tAdvanced engineering materials$$v22$$x1527-2648$$y2020
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