Journal Article

FZJ-2020-01365

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Impact of Laser Treatment on Hydrogenated Amorphous Silicon Properties

Maurer, C. ; Beyer, W.FZJ* ; Hülsbeck, M.FZJ* ; Breuer, U.FZJ* ; Rau, U.FZJ* ; Haas, S. (Corresponding author)FZJ*

2020
Deutsche Gesellschaft für Materialkunde Frankfurt, M.

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Please use a persistent id in citations: http://hdl.handle.net/2128/25199  doi:10.1002/adem.201901437

Abstract: Herein, the application of laser radiation to locally modify the hydrogen distribution within hydrogenated amorphous silicon films on a short time scale is studied. The impact of laser power and irradiation time on the temperature of the silicon layer during the laser treatment and the hydrogen outdiffusion is analyzed. Moreover, the resulting optoelectronic properties of the amorphous silicon are examined. On a timescale of a few seconds or less, the hydrogen concentration in the near‐surface region of the silicon layer can be successfully decreased without major impact on the optoelectronic properties.

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Contributing Institute(s):

1. Photovoltaik (IEK-5)
2. Analytik (ZEA-3)

Research Program(s):

1. 121 - Solar cells of the next generation (POF3-121) (POF3-121)

Appears in the scientific report 2020

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Database coverage:
; ; ; Clarivate Analytics Master Journal List ; Current Contents - Engineering, Computing and Technology ; IF < 5 ; JCR ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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