TY  - JOUR
AU  - Maurer, Claudia
AU  - Beyer, Wolfhard
AU  - Hülsbeck, Markus
AU  - Breuer, Uwe
AU  - Rau, Uwe
AU  - Haas, Stefan
TI  - Impact of Laser Treatment on Hydrogenated Amorphous Silicon Properties
JO  - Advanced engineering materials
VL  - 22
IS  - 6
SN  - 1527-2648
CY  - Frankfurt, M.
PB  - Deutsche Gesellschaft für Materialkunde
M1  - FZJ-2020-01365
SP  - 1901437
PY  - 2020
AB  - Herein, the application of laser radiation to locally modify the hydrogen distribution within hydrogenated amorphous silicon films on a short time scale is studied. The impact of laser power and irradiation time on the temperature of the silicon layer during the laser treatment and the hydrogen outdiffusion is analyzed. Moreover, the resulting optoelectronic properties of the amorphous silicon are examined. On a timescale of a few seconds or less, the hydrogen concentration in the near‐surface region of the silicon layer can be successfully decreased without major impact on the optoelectronic properties.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000517621900001
DO  - DOI:10.1002/adem.201901437
UR  - https://juser.fz-juelich.de/record/874317
ER  -