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@ARTICLE{Maurer:874317,
      author       = {Maurer, Claudia and Beyer, Wolfhard and Hülsbeck, Markus
                      and Breuer, Uwe and Rau, Uwe and Haas, Stefan},
      title        = {{I}mpact of {L}aser {T}reatment on {H}ydrogenated
                      {A}morphous {S}ilicon {P}roperties},
      journal      = {Advanced engineering materials},
      volume       = {22},
      number       = {6},
      issn         = {1527-2648},
      address      = {Frankfurt, M.},
      publisher    = {Deutsche Gesellschaft für Materialkunde},
      reportid     = {FZJ-2020-01365},
      pages        = {1901437},
      year         = {2020},
      abstract     = {Herein, the application of laser radiation to locally
                      modify the hydrogen distribution within hydrogenated
                      amorphous silicon films on a short time scale is studied.
                      The impact of laser power and irradiation time on the
                      temperature of the silicon layer during the laser treatment
                      and the hydrogen outdiffusion is analyzed. Moreover, the
                      resulting optoelectronic properties of the amorphous silicon
                      are examined. On a timescale of a few seconds or less, the
                      hydrogen concentration in the near‐surface region of the
                      silicon layer can be successfully decreased without major
                      impact on the optoelectronic properties.},
      cin          = {IEK-5 / ZEA-3},
      ddc          = {660},
      cid          = {I:(DE-Juel1)IEK-5-20101013 / I:(DE-Juel1)ZEA-3-20090406},
      pnm          = {121 - Solar cells of the next generation (POF3-121)},
      pid          = {G:(DE-HGF)POF3-121},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000517621900001},
      doi          = {10.1002/adem.201901437},
      url          = {https://juser.fz-juelich.de/record/874317},
}