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@ARTICLE{Mussler:877350,
author = {Mussler, Gregor},
title = {{M}olecular‐{B}eam {E}pitaxy of 3{D} {T}opological
{I}nsulator {T}hin {F}ilms and {D}evices on {S}i
{S}ubstrates},
journal = {Physica status solidi / B},
volume = {258},
number = {1},
issn = {0370-1972},
address = {Weinheim},
publisher = {Wiley-VCH},
reportid = {FZJ-2020-02157},
pages = {2000007},
year = {2021},
abstract = {Topological insulators (TIs) are currently in the focus of
interest due to their intriguing physical properties related
to topologically protected surface states. The ability to
grow thin films of these complex layered materials and even
sophisticated devices is the key to explore their
fundamental phenomena, giving insights into modern
solid‐state physics. However, complex materials composed
of layers only weakly bonded via van der Waals (vdW) forces
offer unmatched challenges for the deposition of thin
epitaxial films. Herein, it is reported on the growth of
(Bi,Sb)2(Te,Se)3 TI films on Si (111) substrates using
molecular‐beam epitaxy. Special issues are discussed, such
as understanding the peculiar vdW growth mode, observing and
annihilating crystal defects, reducing bulk carrier
concentration, tuning the Fermi level to the Dirac point,
and, finally, fabricating TI/superconductor devices fully in
situ.},
cin = {PGI-9},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106},
pnm = {899 - ohne Topic (POF4-899)},
pid = {G:(DE-HGF)POF4-899},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000536855800001},
doi = {10.1002/pssb.202000007},
url = {https://juser.fz-juelich.de/record/877350},
}