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@ARTICLE{Jiang:878242,
author = {Jiang, Ting-Ting and Wang, Jiang-Jing and Lu, Lu and Ma,
Chuan-Sheng and Zhang, Dan-Li and Rao, Feng and Jia,
Chun-Lin and Zhang, Wei},
title = {{P}rogressive amorphization of {G}e{S}b{T}e phase-change
material under electron beam irradiation},
journal = {APL materials},
volume = {7},
number = {8},
issn = {2166-532X},
address = {Melville, NY},
publisher = {AIP Publ.},
reportid = {FZJ-2020-02711},
pages = {081121 -},
year = {2019},
abstract = {Fast and reversible phase transitions in chalcogenide
phase-change materials (PCMs), in particular, Ge-Sb-Te
compounds, are not only of fundamental interests but also
make PCMs based random access memory a leading candidate for
nonvolatile memory and neuromorphic computing devices. To
RESET the memory cell, crystalline Ge-Sb-Te has to undergo
phase transitions first to a liquid state and then to an
amorphous state, corresponding to an abrupt change in
electrical resistance. In this work, we demonstrate a
progressive amorphization process in GeSb2Te4 thin films
under electron beam irradiation on a transmission electron
microscope (TEM). Melting is shown to be completely absent
by the in situ TEM experiments. The progressive
amorphization process resembles closely the cumulative
crystallization process that accompanies a continuous change
in electrical resistance. Our work suggests that if
displacement forces can be implemented properly, it should
be possible to emulate symmetric neuronal dynamics by using
PCMs.},
cin = {ER-C-1},
ddc = {600},
cid = {I:(DE-Juel1)ER-C-1-20170209},
pnm = {143 - Controlling Configuration-Based Phenomena (POF3-143)
/ DFG project 167917811 - SFB 917: Resistiv schaltende
Chalkogenide für zukünftige Elektronikanwendungen:
Struktur, Kinetik und Bauelementskalierung "Nanoswitches"
(167917811)},
pid = {G:(DE-HGF)POF3-143 / G:(GEPRIS)167917811},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000483883800009},
doi = {10.1063/1.5102075},
url = {https://juser.fz-juelich.de/record/878242},
}