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000878701 1001_ $$0P:(DE-Juel1)165233$$aDeuter, Valerie$$b0$$eCorresponding author
000878701 245__ $$aComputational proximity lithography with extreme ultraviolet radiation
000878701 260__ $$aWashington, DC$$bSoc.$$c2020
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000878701 520__ $$aThe potential of extreme ultraviolet (EUV) computational proximity lithography for fabrication of arbitrary nanoscale patterns is investigated. We propose to use a holographic mask (attenuating phase shifting mask) consisting of structures of two phase levels. This approach allows printing of arbitrary, non-periodic structures without using high-resolution imaging optics. The holographic mask is designed for a wavelength of 13.5 nm with a conventional high-resolution electron beam resist as the phase shifting medium (pixel size 50 nm). The imaging performance is evaluated by using EUV radiation with different degrees of spatial coherence. Therefore exposures on identical masks are carried out with both undulator radiation at a synchrotron facility and plasma-based radiation at a laboratory setup.
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000878701 7001_ $$0P:(DE-HGF)0$$aGrochowicz, Maciej$$b1
000878701 7001_ $$0P:(DE-HGF)0$$aBrose, Sascha$$b2
000878701 7001_ $$0P:(DE-HGF)0$$aBiller, Jan$$b3
000878701 7001_ $$0P:(DE-HGF)0$$aDanylyuk, Serhiy$$b4
000878701 7001_ $$0P:(DE-HGF)0$$aTaubner, Thomas$$b5
000878701 7001_ $$0P:(DE-HGF)0$$aSiemion, Agnieszka$$b6
000878701 7001_ $$0P:(DE-Juel1)125588$$aGrützmacher, Detlev$$b7$$ufzj
000878701 7001_ $$0P:(DE-HGF)0$$aJuschkin, Larissa$$b8
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