TY  - JOUR
AU  - Deuter, Valerie
AU  - Grochowicz, Maciej
AU  - Brose, Sascha
AU  - Biller, Jan
AU  - Danylyuk, Serhiy
AU  - Taubner, Thomas
AU  - Siemion, Agnieszka
AU  - Grützmacher, Detlev
AU  - Juschkin, Larissa
TI  - Computational proximity lithography with extreme ultraviolet radiation
JO  - Optics express
VL  - 28
IS  - 18
SN  - 1094-4087
CY  - Washington, DC
PB  - Soc.
M1  - FZJ-2020-03019
SP  - 27000 -
PY  - 2020
AB  - The potential of extreme ultraviolet (EUV) computational proximity lithography for fabrication of arbitrary nanoscale patterns is investigated. We propose to use a holographic mask (attenuating phase shifting mask) consisting of structures of two phase levels. This approach allows printing of arbitrary, non-periodic structures without using high-resolution imaging optics. The holographic mask is designed for a wavelength of 13.5 nm with a conventional high-resolution electron beam resist as the phase shifting medium (pixel size 50 nm). The imaging performance is evaluated by using EUV radiation with different degrees of spatial coherence. Therefore exposures on identical masks are carried out with both undulator radiation at a synchrotron facility and plasma-based radiation at a laboratory setup.
LB  - PUB:(DE-HGF)16
C6  - pmid:32906962
UR  - <Go to ISI:>//WOS:000565713200110
DO  - DOI:10.1364/OE.398805
UR  - https://juser.fz-juelich.de/record/878701
ER  -