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001     878701
005     20220930130249.0
024 7 _ |a 10.1364/OE.398805
|2 doi
024 7 _ |a 2128/25596
|2 Handle
024 7 _ |a pmid:32906962
|2 pmid
024 7 _ |a WOS:000565713200110
|2 WOS
037 _ _ |a FZJ-2020-03019
082 _ _ |a 530
100 1 _ |a Deuter, Valerie
|0 P:(DE-Juel1)165233
|b 0
|e Corresponding author
245 _ _ |a Computational proximity lithography with extreme ultraviolet radiation
260 _ _ |a Washington, DC
|c 2020
|b Soc.
336 7 _ |a article
|2 DRIVER
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|b journal
|m journal
|0 PUB:(DE-HGF)16
|s 1599574542_31238
|2 PUB:(DE-HGF)
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a Journal Article
|0 0
|2 EndNote
520 _ _ |a The potential of extreme ultraviolet (EUV) computational proximity lithography for fabrication of arbitrary nanoscale patterns is investigated. We propose to use a holographic mask (attenuating phase shifting mask) consisting of structures of two phase levels. This approach allows printing of arbitrary, non-periodic structures without using high-resolution imaging optics. The holographic mask is designed for a wavelength of 13.5 nm with a conventional high-resolution electron beam resist as the phase shifting medium (pixel size 50 nm). The imaging performance is evaluated by using EUV radiation with different degrees of spatial coherence. Therefore exposures on identical masks are carried out with both undulator radiation at a synchrotron facility and plasma-based radiation at a laboratory setup.
536 _ _ |a 523 - Controlling Configuration-Based Phenomena (POF3-523)
|0 G:(DE-HGF)POF3-523
|c POF3-523
|f POF III
|x 0
588 _ _ |a Dataset connected to CrossRef
700 1 _ |a Grochowicz, Maciej
|0 P:(DE-HGF)0
|b 1
700 1 _ |a Brose, Sascha
|0 P:(DE-HGF)0
|b 2
700 1 _ |a Biller, Jan
|0 P:(DE-HGF)0
|b 3
700 1 _ |a Danylyuk, Serhiy
|0 P:(DE-HGF)0
|b 4
700 1 _ |a Taubner, Thomas
|0 P:(DE-HGF)0
|b 5
700 1 _ |a Siemion, Agnieszka
|0 P:(DE-HGF)0
|b 6
700 1 _ |a Grützmacher, Detlev
|0 P:(DE-Juel1)125588
|b 7
|u fzj
700 1 _ |a Juschkin, Larissa
|0 P:(DE-HGF)0
|b 8
773 _ _ |a 10.1364/OE.398805
|g Vol. 28, no. 18, p. 27000 -
|0 PERI:(DE-600)1491859-6
|n 18
|p 27000 -
|t Optics express
|v 28
|y 2020
|x 1094-4087
856 4 _ |y OpenAccess
|u https://juser.fz-juelich.de/record/878701/files/oe-28-18-27000.pdf
856 4 _ |y OpenAccess
|x pdfa
|u https://juser.fz-juelich.de/record/878701/files/oe-28-18-27000.pdf?subformat=pdfa
909 C O |o oai:juser.fz-juelich.de:878701
|p openaire
|p open_access
|p OpenAPC
|p driver
|p VDB
|p openCost
|p dnbdelivery
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)165233
910 1 _ |a RWTH Aachen
|0 I:(DE-588b)36225-6
|k RWTH
|b 1
|6 P:(DE-HGF)0
910 1 _ |a RWTH Aachen
|0 I:(DE-588b)36225-6
|k RWTH
|b 2
|6 P:(DE-HGF)0
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 3
|6 P:(DE-HGF)0
910 1 _ |a RWTH Aachen
|0 I:(DE-588b)36225-6
|k RWTH
|b 5
|6 P:(DE-HGF)0
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 7
|6 P:(DE-Juel1)125588
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 8
|6 P:(DE-HGF)0
913 1 _ |a DE-HGF
|b Key Technologies
|l Future Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)
|1 G:(DE-HGF)POF3-520
|0 G:(DE-HGF)POF3-523
|2 G:(DE-HGF)POF3-500
|v Controlling Configuration-Based Phenomena
|x 0
|4 G:(DE-HGF)POF
|3 G:(DE-HGF)POF3
914 1 _ |y 2020
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0200
|2 StatID
|b SCOPUS
|d 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0160
|2 StatID
|b Essential Science Indicators
|d 2020-01-02
915 _ _ |a Creative Commons Attribution CC BY 4.0
|0 LIC:(DE-HGF)CCBY4
|2 HGFVOC
915 _ _ |a JCR
|0 StatID:(DE-HGF)0100
|2 StatID
|b OPT EXPRESS : 2018
|d 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0501
|2 StatID
|b DOAJ Seal
|d 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0500
|2 StatID
|b DOAJ
|d 2020-01-02
915 _ _ |a WoS
|0 StatID:(DE-HGF)0110
|2 StatID
|b Science Citation Index
|d 2020-01-02
915 _ _ |a WoS
|0 StatID:(DE-HGF)0111
|2 StatID
|b Science Citation Index Expanded
|d 2020-01-02
915 _ _ |a Fees
|0 StatID:(DE-HGF)0700
|2 StatID
|d 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0150
|2 StatID
|b Web of Science Core Collection
|d 2020-01-02
915 _ _ |a IF < 5
|0 StatID:(DE-HGF)9900
|2 StatID
|d 2020-01-02
915 _ _ |a OpenAccess
|0 StatID:(DE-HGF)0510
|2 StatID
915 _ _ |a Peer Review
|0 StatID:(DE-HGF)0030
|2 StatID
|b DOAJ : Blind peer review
|d 2020-01-02
915 _ _ |a Article Processing Charges
|0 StatID:(DE-HGF)0561
|2 StatID
|f 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)1150
|2 StatID
|b Current Contents - Physical, Chemical and Earth Sciences
|d 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0310
|2 StatID
|b NCBI Molecular Biology Database
|d 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0300
|2 StatID
|b Medline
|d 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0320
|2 StatID
|b PubMed Central
|d 2020-01-02
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0199
|2 StatID
|b Clarivate Analytics Master Journal List
|d 2020-01-02
920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)PGI-10-20170113
|k PGI-10
|l JARA Institut Green IT
|x 0
920 1 _ |0 I:(DE-Juel1)PGI-9-20110106
|k PGI-9
|l Halbleiter-Nanoelektronik
|x 1
920 1 _ |0 I:(DE-82)080009_20140620
|k JARA-FIT
|l JARA-FIT
|x 2
980 _ _ |a journal
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a I:(DE-Juel1)PGI-10-20170113
980 _ _ |a I:(DE-Juel1)PGI-9-20110106
980 _ _ |a I:(DE-82)080009_20140620
980 _ _ |a APC
980 1 _ |a APC
980 1 _ |a FullTexts

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