%0 Book Section
%A Brose, Sascha
%A Danylyuk, Serhiy
%A Tempeler, Jenny
%A Kim, Hyun-su
%A Loosen, Peter
%A Juschkin, Larissa
%Y Panning, Eric M.
%Y Goldberg, Kenneth A.
%T Enabling laboratory EUV research with a compact exposure tool
%V 9776
%@ 0277-786X
%C Bellingham, Wash.
%I SPIE
%M FZJ-2020-03559
%B Proceedings of SPIE
%P 97760R
%D 2016
%B SPIE Advanced Lithography
%C , San Jose (California)
M2 San Jose, California
%F PUB:(DE-HGF)8 ; PUB:(DE-HGF)7
%9 Contribution to a conference proceedingsContribution to a book
%U <Go to ISI:>//WOS:000382314800022
%R 10.1117/12.2219164
%U https://juser.fz-juelich.de/record/885155