Contribution to a conference proceedings/Contribution to a book FZJ-2020-03559

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Enabling laboratory EUV research with a compact exposure tool

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2016
SPIE Bellingham, Wash.

SPIE Advanced Lithography, San JoseSan Jose, California, Bellingham, Wash. : SPIE, Proceedings of SPIE 9776, 97760R () [10.1117/12.2219164]

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Classification:

Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
  2. JARA-FIT (JARA-FIT)
Research Program(s):
  1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2016
Database coverage:
Medline ; Allianz-Lizenz / DFG
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The record appears in these collections:
Document types > Events > Contributions to a conference proceedings
Document types > Books > Contribution to a book
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-9
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Publications database

 Record created 2020-10-02, last modified 2021-01-30


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