TY  - CHAP
AU  - Brose, Sascha
AU  - Danylyuk, Serhiy
AU  - Tempeler, Jenny
AU  - Kim, Hyun-su
AU  - Loosen, Peter
AU  - Juschkin, Larissa
A3  - Panning, Eric M.
A3  - Goldberg, Kenneth A.
TI  - Enabling laboratory EUV research with a compact exposure tool
VL  - 9776
SN  - 0277-786X
CY  - Bellingham, Wash.
PB  - SPIE
M1  - FZJ-2020-03559
T2  - Proceedings of SPIE
SP  - 97760R
PY  - 2016
T2  - SPIE Advanced Lithography
CY  - , San Jose (California)
M2  - San Jose, California
LB  - PUB:(DE-HGF)8 ; PUB:(DE-HGF)7
UR  - <Go to ISI:>//WOS:000382314800022
DO  - DOI:10.1117/12.2219164
UR  - https://juser.fz-juelich.de/record/885155
ER  -