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@INBOOK{Panning:885155,
      author       = {Brose, Sascha and Danylyuk, Serhiy and Tempeler, Jenny and
                      Kim, Hyun-su and Loosen, Peter and Juschkin, Larissa},
      editor       = {Panning, Eric M. and Goldberg, Kenneth A.},
      title        = {{E}nabling laboratory {EUV} research with a compact
                      exposure tool},
      volume       = {9776},
      issn         = {0277-786X},
      address      = {Bellingham, Wash.},
      publisher    = {SPIE},
      reportid     = {FZJ-2020-03559},
      series       = {Proceedings of SPIE},
      pages        = {97760R},
      year         = {2016},
      organization  = {SPIE Advanced Lithography, San Jose
                       (California)},
      cin          = {PGI-9 / JARA-FIT},
      ddc          = {620},
      cid          = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)8 / PUB:(DE-HGF)7},
      UT           = {WOS:000382314800022},
      doi          = {10.1117/12.2219164},
      url          = {https://juser.fz-juelich.de/record/885155},
}