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| Hauptseite > Publikationsdatenbank > From thin relaxed SiGe buffer layers to Strained Silicon directly on Oxide > print |
| Hauptseite > Publikationsdatenbank > From thin relaxed SiGe buffer layers to Strained Silicon directly on Oxide > print |
| 001 | 885256 | ||
| 005 | 20201003142516.0 | ||
| 024 | 7 | _ | |a 1938-5862 |2 ISSN |
| 037 | _ | _ | |a FZJ-2020-03660 |
| 082 | _ | _ | |a 540 |
| 100 | 1 | _ | |a Mantl, S. |0 P:(DE-Juel1)VDB4959 |b 0 |u FZJ |
| 245 | _ | _ | |a From thin relaxed SiGe buffer layers to Strained Silicon directly on Oxide |
| 260 | _ | _ | |a Pennington, NJ |c 2006 |b Electrochemical Society (ECS) |
| 300 | _ | _ | |a 1047 - 1055 |
| 336 | 7 | _ | |a BOOK_CHAPTER |2 ORCID |
| 336 | 7 | _ | |a Book Section |0 7 |2 EndNote |
| 336 | 7 | _ | |a bookPart |2 DRIVER |
| 336 | 7 | _ | |a INBOOK |2 BibTeX |
| 336 | 7 | _ | |a Output Types/Book chapter |2 DataCite |
| 336 | 7 | _ | |a Contribution to a book |b contb |m contb |0 PUB:(DE-HGF)7 |s 53584 |2 PUB:(DE-HGF) |
| 490 | 0 | _ | |a ECS transactions |0 PERI:(DE-600)2251888-5 |v 3 |x 1938-5862 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 536 | _ | _ | |a Grundlagen für zukünftige Informationstechnologien |0 G:(DE-Juel1)FUEK412 |c P42 |2 G:(DE-HGF) |x 0 |
| 700 | 1 | _ | |a Buca, D. |0 P:(DE-Juel1)125569 |b 1 |u FZJ |
| 700 | 1 | _ | |a Holländer, B. |0 P:(DE-Juel1)125595 |b 2 |u FZJ |
| 700 | 1 | _ | |a Lenk, S. |0 P:(DE-Juel1)128602 |b 3 |u FZJ |
| 700 | 1 | _ | |a Hueging, N. |0 P:(DE-Juel1)VDB26077 |b 4 |u FZJ |
| 700 | 1 | _ | |a Luysberg, M. |0 P:(DE-Juel1)130811 |b 5 |u FZJ |
| 700 | 1 | _ | |a Carius, R. |0 P:(DE-Juel1)VDB4964 |b 6 |u FZJ |
| 700 | 1 | _ | |a Loo, R. |0 P:(DE-HGF)0 |b 7 |
| 700 | 1 | _ | |a Caymax, M. |0 P:(DE-HGF)0 |b 8 |
| 700 | 1 | _ | |a Schäfer, H. |0 P:(DE-HGF)0 |b 9 |
| 700 | 1 | _ | |a Radu, I. |0 P:(DE-HGF)0 |b 10 |
| 700 | 1 | _ | |a Reiche, M. |0 P:(DE-HGF)0 |b 11 |
| 700 | 1 | _ | |a Christiansen, S. H. |0 P:(DE-HGF)0 |b 12 |
| 700 | 1 | _ | |a Gösele, U. |0 P:(DE-HGF)0 |b 13 |
| 909 | C | O | |o oai:juser.fz-juelich.de:885256 |p VDB |
| 913 | 1 | _ | |b Schlüsseltechnologien |k P42 |l Grundlagen für zukünftige Informationstechnologien (FIT) |0 G:(DE-Juel1)FUEK412 |v Grundlagen für zukünftige Informationstechnologien |x 0 |
| 914 | 1 | _ | |y 2006 |
| 915 | _ | _ | |a Peer review |0 StatID:(DE-HGF)0030 |2 StatID |
| 920 | 1 | _ | |d 14.09.2008 |g CNI |k CNI |l Center of Nanoelectronic Systems for Information Technology |0 I:(DE-Juel1)VDB381 |x 1 |z 381 |
| 920 | 1 | _ | |d 31.12.2006 |g ISG |k ISG-1 |l Institut für Halbleiterschichten und Bauelemente |0 I:(DE-Juel1)VDB41 |x 0 |
| 980 | _ | _ | |a contb |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a I:(DE-Juel1)VDB381 |
| 980 | _ | _ | |a I:(DE-Juel1)VDB41 |
| 980 | _ | _ | |a UNRESTRICTED |
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