Contribution to a book

FZJ-2020-03720

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Tuning the Performance of Pt/HfO2/Ti/Pt ReRAM Devices Obtained from Plasma-Enhanced Atomic Layer Deposition for HfO2 Thin Films

Hardtdegen, A.FZJ* ; Zhang, H.FZJ* ; Hoffmann-Eifert, S.FZJ*

2016
Pennington, NJ

This record in other databases:  

Please use a persistent id in citations: doi:10.1149/07506.0177ecst

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Contributing Institute(s):

1. Elektronische Materialien (PGI-7)
2. JARA Institut Green IT (PGI-10)
3. Agrosphäre (IBG-3)
4. JARA-FIT (JARA-FIT)

Research Program(s):

1. 524 - Controlling Collective States (POF3-524) (POF3-524)

Appears in the scientific report 2016

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Database coverage:
; No Authors Fulltext ; SCOPUS

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