Journal Article PreJuSER-21358

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Non-volatile gated variable resistor based on doped La2CuO4+delta and SrTiO3 heterostructures

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2012
American Institute of Physics Melville, NY

Journal of applied physics 111, 056101 () [10.1063/1.3691599]

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Abstract: Gated variable resistors were manufactured by depositing epitaxial heterostructures of doped La2CuO4+delta and SrTiO3 layers. Their conductance change as function of write current I and write time t followed a simple empirical law of the form Delta G/G = CI(A)t(B). This behavior is in agreement with ionic transport that accelerates exponentially with electrical field strength. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3691599]

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Note: Record converted from VDB: 12.11.2012

Contributing Institute(s):
  1. Mikrostrukturforschung (PGI-5)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2012
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Medline ; OpenAccess by Allianz-OA ; OpenAccess ; Allianz-Lizenz / DFG ; Current Contents - Social and Behavioral Sciences ; JCR ; NationallizenzNationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection
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 Record created 2012-11-13, last modified 2024-06-10


Published under German "Allianz" Licensing conditions on 2012-03-02. Available in OpenAccess from 2012-03-02:
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