Contribution to a conference proceedings FZJ-2024-00972

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Vertical gate-all-around SiGeSn/GeSn/SiGeSn nanowire nFETs

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2023

Intern. Conf. Solid State Devices and Materials, SSDM, NagoyaNagoya, Japan, 5 Sep 2023 - 8 Sep 20232023-09-052023-09-08 PS 1-13 ()


Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
Research Program(s):
  1. 5234 - Emerging NC Architectures (POF4-523) (POF4-523)
  2. Verbundprojekt: Erforschung nanoelektronischer Höchstleistungs-Bauelemente für innovative Elektronik auf Basis neuer Materialsysteme - ForMikro-SiGeSn-NanoFETs - , Teilvorhaben: CVD-basierte Herstellung von SiGeSn-Halbleiterheterostrukturen und vertikalen (16ES1074) (16ES1074)

Appears in the scientific report 2023
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 Record created 2024-01-26, last modified 2024-02-26



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