Journal Article FZJ-2025-04540

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Threshold switching in vertically aligned MoS2/SiOx heterostructures based on silver ion migration

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2025
Nature Publishing Group London

npj 2D materials and applications 9(1), 86 () [10.1038/s41699-025-00614-9]

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Contributing Institute(s):
  1. Elektronische Materialien (PGI-7)
  2. JARA-FIT (JARA-FIT)
  3. Materialwissenschaft u. Werkstofftechnik (ER-C-2)
Research Program(s):
  1. 5233 - Memristive Materials and Devices (POF4-523) (POF4-523)
  2. BMBF 16ME0398K - Verbundprojekt: Neuro-inspirierte Technologien der künstlichen Intelligenz für die Elektronik der Zukunft - NEUROTEC II - (BMBF-16ME0398K) (BMBF-16ME0398K)
  3. BMFTR 03ZU2106AB - NeuroSys: KI-anwendungsspezifische Technologiereifung memristiver Bauteile (Projekt A) - Teilvorhaben B (03ZU2106AB) (03ZU2106AB)
  4. DFG project G:(GEPRIS)441918103 - Hybride „MEMristor-CMOS Mikroelektroden-Array“ Biosensorik-Plattform (MEMMEA) (441918103) (441918103)

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Medline ; Creative Commons Attribution CC BY (No Version) ; DOAJ ; Article Processing Charges ; Clarivate Analytics Master Journal List ; Current Contents - Physical, Chemical and Earth Sciences ; DOAJ Seal ; Essential Science Indicators ; Fees ; IF >= 5 ; JCR ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection
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The record appears in these collections:
Document types > Articles > Journal Article
Institute Collections > ER-C > ER-C-2
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-7
Workflow collections > Public records
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 Record created 2025-11-18, last modified 2025-11-18


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