Journal Article

FZJ-2025-05143

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Advancing the Growth of GaN on AlScN and AlYN by Metal–Organic Chemical Vapor Deposition

Streicher, I. (Corresponding author) ; Wolff, N. ; Duarte, T. ; Rehm, O. ; Straňák, P. ; Kirste, L. ; Prescher, M. ; Guo, X. ; Nicolosi, V. ; Baumgarten, L.FZJ* ; Müller, M.FZJ* ; Kienle, L. ; Leone, S.

2025
Wiley-VCH GmbH Weinheim

This record in other databases:  

Please use a persistent id in citations: doi:10.1002/apxr.202500035  doi:10.34734/FZJ-2025-05143

---

Contributing Institute(s):

1. Elektronische Eigenschaften (PGI-6)

Research Program(s):

1. 5211 - Topological Matter (POF4-521) (POF4-521)

Appears in the scientific report 2025

---

Database coverage:
; ; ; Article Processing Charges ; Clarivate Analytics Master Journal List ; DEAL Wiley ; DOAJ Seal ; Emerging Sources Citation Index ; Fees ; Web of Science Core Collection

---