Journal Article

FZJ-2026-03073

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Comparison of three titanium-precursors for atomic-layer-deposited TiO2 for passivating contacts on silicon

Hiller, D. (Corresponding author) ; Munnik, F. ; López-Vidrier, J. ; Solonenko, D. ; Reif, J. ; Knaut, M. ; Thimm, O.FZJ* ; Grant, N. E.

2024
Inst. New York, NY

This record in other databases:  

Please use a persistent id in citations: doi:10.1116/6.0003309  doi:10.34734/FZJ-2026-03073

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Contributing Institute(s):

1. Photovoltaik (IMD-3)

Research Program(s):

1. 1213 - Cell Design and Development (POF4-121) (POF4-121)

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Database coverage:
; ; ; Clarivate Analytics Master Journal List ; Current Contents - Electronics and Telecommunications Collection ; Current Contents - Engineering, Computing and Technology ; Current Contents - Physical, Chemical and Earth Sciences ; Essential Science Indicators ; IF < 5 ; JCR ; National-Konsortium ; SCOPUS ; Science Citation Index Expanded ; Web of Science Core Collection

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