Journal Article

FZJ-2026-03843

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png N‐Type Behavior from a P‐Type Dopant: Charge Compensation Mechanisms in Trivalent Y‐Doped HfO 2

Rehm, O. ; Baumgarten, L.FZJ* ; Wunderwald, F. ; Fuhrberg, A. ; Düring, P. M. ; Gloskovskii, A. ; Schlueter, C. ; Mikolajick, T. ; Schroeder, U. ; Müller, M. (Corresponding author)FZJ*

2026
Wiley-VCH GmbH Weinheim

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Please use a persistent id in citations: doi:10.1002/apxr.202500120  doi:10.34734/FZJ-2026-03843

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Contributing Institute(s):

1. Elektronische Eigenschaften (PGI-6)

Research Program(s):

1. 5211 - Topological Matter (POF4-521) (POF4-521)

Appears in the scientific report 2026

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Database coverage:
; ; ; Article Processing Charges ; Clarivate Analytics Master Journal List ; DEAL Wiley ; DOAJ Seal ; Emerging Sources Citation Index ; Fees ; Web of Science Core Collection

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