Book/Dissertation / PhD Thesis

FZJ-2026-04131

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Liquid-Phase Synthesis of Silicon and Silicon Carbide Thin-Films via Atmospheric Pressure Chemical Vapor Deposition

Fischer, B. (Corresponding author)FZJ*

2026
Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag Jülich
ISBN: 978-3-95806-991-6

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Please use a persistent id in citations: doi:10.34734/FZJ-2026-04131

Abstract: Hydrogenated amorphous silicon (a-Si:H) and silicon carbide (a-SiC:H) thin films are essential materials for optoelectronic and photovoltaic devices. High-quality layers of these materials are typically produced using vacuum-based deposition techniques, such as plasma enhanced chemical vapor deposition (PECVD). However, these methods require expensive equipment and complex infrastructure, which limits their economic viability. Atmospheric pressure chemical vapor deposition (APCVD) offers a promising alternative, as it avoids the need for ultra-high vacuum infrastructure. Successfully addressing challenges in precursor handling, film quality, and process reproducibility could make this approach a cost-effective method for producing a-Si:H and a-SiC:H thin films. ...

Note: Dissertation, RWTH Aachen University, 2026

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Contributing Institute(s):

1. Photovoltaik (IMD-3)

Research Program(s):

1. 1213 - Cell Design and Development (POF4-121) (POF4-121)

Appears in the scientific report 2026

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