Journal Article

FZJ-2012-00158

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png On the nature of the interfacial layer in ultra-thin TiN/LaLuO3 gate stacks

Mitrovic, I. Z. (Corresponding author) ; Hall, S.FZJ* ; Sedghi, N. ; Simutis, G. ; Dhanak, V. R. ; Bailey, P. ; Noakes, T. C. Q. ; Alexandrou, I. ; Engstrom, O. ; Lopes, J. M. J. ; Schubert, J.

2012
American Institute of Physics Melville, NY

This record in other databases:  

Please use a persistent id in citations: http://hdl.handle.net/2128/4843  doi:10.1063/1.4746790

---

Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)

Research Program(s):

1. 42G - Peter Grünberg-Centre (PG-C) (POF2-42G41) (POF2-42G41)

Appears in the scientific report 2012

---

Database coverage:
; ; ; Allianz-Lizenz / DFG ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection ; Zoological Record

---