Poster (Other) FZJ-2014-00604

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Innovative fabrication of columnar InxGa1-xN/GaN nanostructures for photovoltaic applications

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2013

15th European Workshop on Metalorganic Vapour Phase Epitaxie, EWMOVPE XV, AachenAachen, Germany, 2 Jun 2013 - 5 Jun 20132013-06-022013-06-05

Abstract: Group III-nitride nanostructures for future generation, high efficient energy device applications were fabricated by capping nanostructured GaN templates with InxGa1-xN grown by metal-organic vapour phase epitaxy (MOVPE) in a concentration range of x between 0 and 1. The nanostructure GaN templates exhibit a high crystallinity and excellent optical properties before overgrowth. After overgrowth a large band gap variation in the solar spectrum could be achieved. The indium concentration in the ternary InxGa1-xN alloy was controllable between x = 0 to 1. The investigations demonstrate that the nanostructures are promising for photovoltaic applications.


Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
Research Program(s):
  1. 421 - Frontiers of charge based Electronics (POF2-421) (POF2-421)

Appears in the scientific report 2013
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Institute Collections > PGI > PGI-9
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 Record created 2014-01-21, last modified 2021-01-29



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