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Lanthanum Lutetium oxide integration in a gate-first process on SOI MOSFETs

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2011

IEEE Proceeding of 12th International Conference on Ultimate Integration on Silicon (ULIS), Cork, Ireland, 14-16 March 2011. - S. 167 - 170


Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
  2. Mikrostrukturforschung (PGI-5)
  3. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
  4. Zentralabteilung für Chemische Analysen (ZCH)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2011
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The record appears in these collections:
Document types > Presentations > Conference Presentations
Institute Collections > ER-C > ER-C-1
JARA > JARA > JARA-JARA\-FIT
Institute Collections > ZEA > ZEA-3
Institute Collections > PGI > PGI-5
Institute Collections > PGI > PGI-9
Document types > Books > Books
Workflow collections > Public records
Publications database
 Record created 2012-11-13, last modified 2024-06-10
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