Home > Publications database > X-ray Nanodiffraction on a Single SiGe Quantum Dot inside a Functioning Field-Effect Transistor |
Journal Article | PreJuSER-15801 |
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2011
ACS Publ.
Washington, DC
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Please use a persistent id in citations: doi:10.1021/nl2013289
Abstract: For advanced electronic, optoelectronic, or mechanical nanoscale devices a detailed understanding of their structural properties and in particular the strain state within their active region is of utmost importance. We demonstrate that X-ray nanodiffraction represents an excellent tool to investigate the internal structure of such devices in a nondestructive way by using a focused synchotron X-ray beam with a diameter of 400 nm. We show results on the strain fields in and around a single SiGe island, which serves as stressor for the Si-channel in a fully functioning Si-metal-oxide semiconductor field-effect transistor.
Keyword(s): Germanium: chemistry (MeSH) ; Nanotechnology (MeSH) ; Particle Size (MeSH) ; Quantum Dots (MeSH) ; Semiconductors (MeSH) ; Silicon: chemistry (MeSH) ; Surface Properties (MeSH) ; Transistors, Electronic (MeSH) ; X-Rays (MeSH) ; Silicon ; Germanium ; J ; X-ray nanodiffraction (auto) ; semiconductor nanostructures (auto) ; structural investigations (auto) ; finite element simulations (auto) ; ordered island growth (auto) ; silicon germanium (auto)
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